Type:

Other

Description:

In this activity, by the Concord Consortium's Molecular Literacy project, students "undertake a simulation of the Atomic Layer Deposition (ALD) technique, a CVD process in which two complementary precursors (e.g., Al(CH3)3 and H2O) are alternatively introduced into the reaction chamber, and build an atomic scale film." The activity itself is a java-based interactive resource built upon the free, open source Molecular Workbench software. In the activity, students are allowed to explore at their own pace in a digital environment which allows them to manipulate the variables in the simulation and create a report of the data captured. In addition to the activity, visitors will find an overview of the activity, a link to more information about how the process is used in manufacturing, and an explanation of the central concepts.

Subjects:

  • Science > General
  • Science > Chemistry
  • Science > Biology
  • Science > Technology
  • Education > General

Education Levels:

  • Grade 1
  • Grade 2
  • Grade 3
  • Grade 4
  • Grade 5
  • Grade 6
  • Grade 7
  • Grade 8
  • Grade 9
  • Grade 10
  • Grade 11
  • Grade 12

Keywords:

Vocational Education,NSDL,Science -- Chemistry,Undergraduate (Lower Division),Science -- Instructional issues,Science -- Biology,Vocational Education -- Technology,oai:nsdl.org:2200/20110201170355138T,Life Science,Technical Education (Upper Division),Informal Education,NSDL_SetSpec_ncs-NSDL-COLLECTION-000-003-112-021,Higher Education,Undergraduate (Upper Division),Science,Chemistry,General Public,Technical Education (Lower Division),High School,Vocational/Professional Development Education,Education,Technology,Science -- Technology

Language:

English

Access Privileges:

Public - Available to anyone

License Deed:

Creative Commons Attribution Non-Commercial Share Alike

Collections:

None
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