Type:

Other

Description:

This website includes an animation which illustrates the ion implant process. Objective: Name the three common dopants used in implantation processes and explain the process of generating an ion beam from source to wafer. You can find this animation under the heading "Process & Equipment III." This simulation is from Module 026 of the Process & Equipment III Cluster of the MATEC Module Library (MML). To view other clusters or for more information about the MML visit http://matec.org/ps/library3/process_I.shtmlKey

Subjects:

  • Science > Engineering
  • Science > Technology
  • Science > Physics
  • Education > General

Education Levels:

  • Grade 1
  • Grade 2
  • Grade 3
  • Grade 4
  • Grade 5
  • Grade 6
  • Grade 7
  • Grade 8
  • Grade 9
  • Grade 10
  • Grade 11
  • Grade 12

Keywords:

NSDL_SetSpec_ncs-NSDL-COLLECTION-000-003-112-021,oai:nsdl.org:2200/20121026125009300T,NSDL,Technical Education (Upper Division),Technical Education (Lower Division),Physics,Undergraduate (Upper Division),Undergraduate (Lower Division),Science -- Physics,Vocational Education -- Instructional issues,Higher Education,Engineering,Education,Science -- Instructional issues,Science -- Engineering,Technology,Vocational/Professional Development Education,Graduate/Professional,Science -- Technology

Language:

English

Access Privileges:

Public - Available to anyone

License Deed:

Creative Commons Attribution Non-Commercial Share Alike

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None
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