Type:

Other

Description:

In this activity, learners use UV light to transfer a pattern onto a plastic board. The pattern is transferred by placing a mask (a transparency sheet with the pattern) on a plastic board. The board is coated with a copper film that is covered with a light-reactive polymer (photo-resist). The polymer is exposed to UV light through the mask to make a pattern in the polymer. The metal under the exposed polymer is then chemically etched, leaving only the pattern on the surface of the board as determined by the mask. This top-down approach to nanotechnology is commonly used in manufacturing circuit boards for computers and other electronics.

Subjects:

  • Computer Science > General
  • Education > General

Education Levels:

  • Grade 1
  • Grade 2
  • Grade 3
  • Grade 4
  • Grade 5
  • Grade 6
  • Grade 7
  • Grade 8
  • Grade 9
  • Grade 10
  • Grade 11
  • Grade 12

Keywords:

NSDL,resist,NSDL_SetSpec_ncs-NSDL-COLLECTION-000-003-112-056,Computer science,Engineering,photolithography,Materials science,Electromagnetic Spectrum,oai:nsdl.org:2200/20120711084153281T,Energy and Power,Sunlight and Color,General science,electronics,Impacts of Technology,Informal Education,Higher Education,Metallurgy and Materials Engineering,Physical science,Conducting Investigations,nanotechnology,Chemistry,Physics,Nanotechnology,Computing and Information,circuit boards,UV light,Chemical Reactions,nanoscience,Computer Engineering,High School,Science and society,Electrical Engineering,Education,Technology,Space Science

Language:

English

Access Privileges:

Public - Available to anyone

License Deed:

Creative Commons Attribution Non-Commercial Share Alike

Collections:

None
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